Open procedure tender pursuant to art. 71 of Legislative Decree 36/2023 for the supply of a system for plasma-assisted reactive ion removal inductively coupled (Inductively Coupled Plasma Reactive Ion Etching, ICP-RIE)

Gara a procedura aperta ai sensi dell’art. 71 del D.Lgs. 36/2023 per la fornitura di un sistema per la rimozione ionica reattiva assistita da plasma accoppiato induttivamente (Inductively Coupled Plasma Reactive Ion Etching, ICP-RIE)

Italy